Most Recent Additions
Honoring Human Growth and Contributions to the Community
Vesna Markovic
Jazz Combo Recital
Corey Anco, Matt Noyes, Saul Ortega, Cory Sackett, and Steve Jacobson
Your Origin Story is Your Superpower!
Gregory Clemons
Interaction between triblock copolymer surfactant and low-κ dielectric surfaces relevant to CMP
Joseph W. Buthker, Jason J. Keleher, and Andrew A. Gewirth
Evaluation of the catalytic decomposition of H2O2through use of organo-metallic complexes - A potential link to the luminol presumptive blood test
Thomas J. Soderquist, Olivia M. Chesniak, Matthew R. Witt, Alan Paramo, Victoria A. Keeling, and Jason J. Keleher
Lead Memory in General Aviation Aircraft Engine Emissions
Randal DeMik, Jason Keleher, Natalie Kasak, Julius Keller, Alessandro Mazza, and Jordan Raess
A biomimetic cellulose-based composite material that incorporates the antimicrobial metal-organic framework HKUST-1
Thomas A. Rickhoff, Erin Sullivan, L. K. Werth, Daniel S. Kissel, and Jason J. Keleher
Unraveling Slurry Chemistry/Nanoparticle/Polymeric Membrane Adsorption Relevant to Cu Chemical Mechanical Planarization (CMP) Filtration Applications
T. B. Zubi, R. A. Wiencek, A. L. Mlynarski, J. M. Truffa, K. M. Wortman-Otto, C. Saucedo, M. G. Salinas, C. F. Graverson, and J. J. Keleher
Strategic Design of Antimicrobial Hydrogels Containing Biomimetic Additives for Enhanced Matrix Responsiveness and HDFa Wound Healing Rates
Abigail N. Linhart, Katherine M. Wortman-Otto, Ian Deninger, Abigail L. Dudek, Heather R. Lange, Dany M. Danhausen, Carolyn F. Graverson, Thomas J. Beckmann, Mallory A. Havens, and Jason J. Keleher
Synergistic Effect of Pad “Macroporous-Reactors” on Passivation Mechanisms to Modulate Cu Chemical Mechanical Planarization (CMP) Performance
Katherine M. Wortman-Otto, Carolyn F. Graverson, Abigail N. Linhart, Rose K. McDonough, Amy L. Mlynarski, and Jason J. Keleher
Role of Molecular Structure on Modulating the Interfacial Dynamics for Shallow Trench Isolation (STI) Chemical Mechanical Planarization (CMP) Applications
Katherine M. Wortman-Otto, Abigail N. Linhart, Abigail L. Dudek, Brian M. Sherry, and Jason J. Keleher
Communication—An Analysis of Shear Forces in Post-CMP PVA Brush Scrubbing for Stationary and Rotating Wafers
Y. Sampurno, A. N. Linhart, K. M. Wortman-Otto, A. Philipossian, and J. J. Keleher
Understanding the Reasons Behind Defect Levels in Post-Copper-CMP Cleaning Processes with Different Chemistries and PVA Brushes
Y. Sampurno, A. Philipossian, A. N. Linhart, K. M. Wortman-Otto, W-T Tseng, D. Tamboli, and J. J. Keleher
Evaluation of a Photosensitizer Redox Couple for Oxide Removal Rate Tunability in Shallow Trench Isolation Chemical Mechanical Planarization
Abigail N. Linhart, Katherine M. Wortman-Otto, and Jason J. Keleher
Harnessing Fe(III)–Carboxylate Photochemistry for Radical-Initiated Polymerization in Hydrogels
M. H. Jayan S. Karunarathna, Abigail N. Linhart, Giuseppe E. Giammanco, Amie E. Norton, Jackson J. Chory, Jason J. Keleher, and Alexis D. Ostrowski
Design of “Low Stress” Post-CMP Cleaning Processes for Advanced Technology Nodes
Kiana A. Cahue, Abigail L. Dudek, Mantas M. Miliauskas, Tatiana R. Cahue, Amy Mlynarski, and Jason J. Keleher
Coupling Supramolecular Assemblies and Reactive Oxygen Species (ROS) with Megasonic Action for Applications in Shallow Trench Isolation (STI) Post-Chemical Mechanical Planarization (p-CMP) Cleaning
Katherine M. Wortman-Otto, Don Watson, Don Dussault, and Jason J. Keleher
Slurry Activation for Enhanced Surface Redox Reactions in CMP
Ara Philipossian, Yasa Sampurno, Fritz Redeker, Kiana A. Cahue, and Jason J. Keleher
*Updated as of 05/28/25.
