Most Popular Papers*

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Ladder of Inference
Emily Westphal

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Role of Molecular Structure on Modulating the Interfacial Dynamics for Shallow Trench Isolation (STI) Chemical Mechanical Planarization (CMP) Applications
Katherine M. Wortman-Otto, Abigail N. Linhart, Abigail L. Dudek, Brian M. Sherry, and Jason J. Keleher

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Unraveling Slurry Chemistry/Nanoparticle/Polymeric Membrane Adsorption Relevant to Cu Chemical Mechanical Planarization (CMP) Filtration Applications
T. B. Zubi, R. A. Wiencek, A. L. Mlynarski, J. M. Truffa, K. M. Wortman-Otto, C. Saucedo, M. G. Salinas, C. F. Graverson, and J. J. Keleher

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Synergistic Effect of Pad “Macroporous-Reactors” on Passivation Mechanisms to Modulate Cu Chemical Mechanical Planarization (CMP) Performance
Katherine M. Wortman-Otto, Carolyn F. Graverson, Abigail N. Linhart, Rose K. McDonough, Amy L. Mlynarski, and Jason J. Keleher

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